Speaking about Intel’s foundry roadmap, Lip-Bu Tan said the company remains “laser focused on the most advanced 14A ...

Hillsboro, Ore. — Intel Corp. has installed an extreme-ultraviolet (EUV) micro-exposure tool at its development fab here that is capable of exposing 30-nanometer isolated lines. Beginning this week, ...

Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.

Intel Corp. today claimed two significant milestones in the development of extreme-ultraviolet (EUV) lithography through the installation of the world’s first commercial EUV lithography tool and EUV ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday ...

Intel is expected to massively expand its Oregon fabrication facilities to develop future process nodes, likely 7nm EUV. Following up from Intel's promise to expand in Oregon, Ireland, and Israel, ...

DUBLIN (Reuters) - Chipmaker Intel said on Friday it had begun high-volume production using extreme ultraviolet (EUV) lithography machines at its $18.5 billion plant in Ireland, calling it a "landmark ...

There are many reasons why it is getting harder to produce leading-edge processors, but no roadblock is bigger than photolithography, the process of using light to transfer patterns to the wafer. The ...

Intel's already-rough process technology ramp took another hit last week. According to Mark Li, an electronics engineer and analyst with Bernstein, the company will delay its introduction of Extreme ...